TEM investigation of MoSeC films
TEM investigation of MoSeC films
Transition metal dichalcogenides (TMD) are widely used as self-lubricating material either as oil additive or directly as thin films. Magnetron sputtering is a deposition method allowing depositing such films with high density and adhesion. However, their spread use in practical applications is still hindered since their excellent sliding properties are deteriorated in the presence of humidity and under high contact pressures. MoSe2, one of the members of TMD family recently studied, has been co-sputtered with carbon in order to improve the mechanical and tribological properties when compared to pure MoSe2 films
7-10
Sandu, C. Silviu
ff3cedc8-4aa4-4b4f-ab9c-91686f32064b
Polcar, Tomas
c669b663-3ba9-4e7b-9f97-8ef5655ac6d2
Cavaleiro, Albano
83fb0417-34af-4c14-b4b4-b9541e4fc652
3 October 2008
Sandu, C. Silviu
ff3cedc8-4aa4-4b4f-ab9c-91686f32064b
Polcar, Tomas
c669b663-3ba9-4e7b-9f97-8ef5655ac6d2
Cavaleiro, Albano
83fb0417-34af-4c14-b4b4-b9541e4fc652
Sandu, C. Silviu, Polcar, Tomas and Cavaleiro, Albano
(2008)
TEM investigation of MoSeC films.
Microscopy and Microanalysis, 14, supplement 3, .
(doi:10.1017/S1431927608089228).
Abstract
Transition metal dichalcogenides (TMD) are widely used as self-lubricating material either as oil additive or directly as thin films. Magnetron sputtering is a deposition method allowing depositing such films with high density and adhesion. However, their spread use in practical applications is still hindered since their excellent sliding properties are deteriorated in the presence of humidity and under high contact pressures. MoSe2, one of the members of TMD family recently studied, has been co-sputtered with carbon in order to improve the mechanical and tribological properties when compared to pure MoSe2 films
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Published date: 3 October 2008
Organisations:
nCATS Group
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Local EPrints ID: 199791
URI: http://eprints.soton.ac.uk/id/eprint/199791
ISSN: 1431-9276
PURE UUID: 6395b1e7-78fb-4773-8e8e-054b1838424e
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Date deposited: 20 Oct 2011 13:48
Last modified: 15 Mar 2024 03:40
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Author:
C. Silviu Sandu
Author:
Albano Cavaleiro
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