Self-adaptive low friction coatings based on transition metal dichalcogenides
Self-adaptive low friction coatings based on transition metal dichalcogenides
This paper deals with three fundamentally different concepts of self-lubricant coatings based on the transition metal dichalcogenides (TMD) and deposited by magnetron sputtering. The first two designs could be considered as traditional: the TMD films doped by carbon or nitrogen. The main attention is aimed at qualitative description of surface and sub-surface modification of the films as the result of the sliding process. Based on a thorough analysis of the worn surfaces, two features emerge: self-adaptability, where originally randomly oriented TMD phase becomes well oriented (i.e. with basal planes parallel to the surface), and limited role of carbon or nitrogen in the contact. The films doped with carbon are the best solution for humid environment, while those doped with nitrogen are ideal for use in dry environment or vacuum. The last concept deals with the combination of a hard TiN matrix deposited by reactive magnetron sputtering with fullerene-like TMD nanoclusters, which are directly injected into the growing TiN film. Despite the embryonic stage of the process development limiting in many ways the final properties of the film, the mechanical properties seem to be promising. The fullerene-like structure of TMD is well maintained and the composite hardness is relatively high compared to the competitive self-lubricant coating designs. On the other hand, the tribological tests did not show any effect of the embedded TMD nanoclusters in the sliding process.
transition metal dichalcogenide, tribology, self-lubricant, fullerene-like particle, magnetron sputtering, tungsten disulphide
4037-4044
Polcar, Tomas
c669b663-3ba9-4e7b-9f97-8ef5655ac6d2
Cavaleiro, Albano
83fb0417-34af-4c14-b4b4-b9541e4fc652
1 April 2011
Polcar, Tomas
c669b663-3ba9-4e7b-9f97-8ef5655ac6d2
Cavaleiro, Albano
83fb0417-34af-4c14-b4b4-b9541e4fc652
Polcar, Tomas and Cavaleiro, Albano
(2011)
Self-adaptive low friction coatings based on transition metal dichalcogenides.
[in special issue: Carbon- or Nitrogen-Containing Nanostructured Composite Films]
Thin Solid Films, 519 (12), .
(doi:10.1016/j.tsf.2011.01.180).
Abstract
This paper deals with three fundamentally different concepts of self-lubricant coatings based on the transition metal dichalcogenides (TMD) and deposited by magnetron sputtering. The first two designs could be considered as traditional: the TMD films doped by carbon or nitrogen. The main attention is aimed at qualitative description of surface and sub-surface modification of the films as the result of the sliding process. Based on a thorough analysis of the worn surfaces, two features emerge: self-adaptability, where originally randomly oriented TMD phase becomes well oriented (i.e. with basal planes parallel to the surface), and limited role of carbon or nitrogen in the contact. The films doped with carbon are the best solution for humid environment, while those doped with nitrogen are ideal for use in dry environment or vacuum. The last concept deals with the combination of a hard TiN matrix deposited by reactive magnetron sputtering with fullerene-like TMD nanoclusters, which are directly injected into the growing TiN film. Despite the embryonic stage of the process development limiting in many ways the final properties of the film, the mechanical properties seem to be promising. The fullerene-like structure of TMD is well maintained and the composite hardness is relatively high compared to the competitive self-lubricant coating designs. On the other hand, the tribological tests did not show any effect of the embedded TMD nanoclusters in the sliding process.
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e-pub ahead of print date: 22 January 2011
Published date: 1 April 2011
Keywords:
transition metal dichalcogenide, tribology, self-lubricant, fullerene-like particle, magnetron sputtering, tungsten disulphide
Organisations:
nCATS Group
Identifiers
Local EPrints ID: 199867
URI: http://eprints.soton.ac.uk/id/eprint/199867
ISSN: 0040-6090
PURE UUID: 154b540c-6bbf-45e7-a379-a4b5adcd6ef4
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Date deposited: 21 Oct 2011 09:01
Last modified: 15 Mar 2024 03:40
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Author:
Albano Cavaleiro
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