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Chemical vapor deposition of niobium disulfide thin films

Chemical vapor deposition of niobium disulfide thin films
Chemical vapor deposition of niobium disulfide thin films
Atmospheric pressure chemical vapor deposition (APCVD) of niobium sulfide coatings was achieved on glass substrates from the reaction of NbCl5 and S(SiMe3)(2), tBu(2)S(2), tBuSH, or HSCH2CH2SH at 250-600degreesC. The niobium sulfide films grown at temperatures above 500degreesC were crystalline, and powder X-ray diffraction showed that two polytypes of NbS2 were produced. The sulfur precursor used is fundamental to the polytype of NbS2 obtained; films that are grown from the APCVD reaction of NbCl5 and S(SiMe3)(2) or tBu(2)S(2) at 500-600degreesC crystallize into the 1T structure, whereas those grown from the APCVD reaction of NbCl5 and tBuSH or HSCH2CH2SH at 500-600 degreesC crystallize into the 3R structure. Energy dispersive X-ray analysis (EDXA) studies gave elemental ratios close to the expected 1:2 ratio for Nb:S. Scanning electron microscopy (SEM) revealed surface morphologies consistent with an island growth mechanism. The films were also characterized using Raman and X-ray photoelectron spectroscopy, both of which showed differences consistent with the formation of the two polytypes, 1T and 3R-NbS2.
niobium disulfide, thin films, chemical vapor deposition, optical-absorption, crystal-structure, nbs2, suspensions, 1t-tas2, phase, glass
1434-1948
4470-4476
Carmalt, Claire J.
eb7d35e3-cde5-46c7-a6ee-5951c374923c
Peters, Emily S.
a5d5947f-031a-46dd-a38f-4d996a3ccea2
Parkin, Ivan P.
7f95b9c4-1f9d-441c-8d43-ac8ea2554b85
Manning, Troy D.
1dab9fe1-54df-4aff-b4db-455264d28af6
Hector, Andrew L.
f19a8f31-b37f-4474-b32a-b7cf05b9f0e5
Carmalt, Claire J.
eb7d35e3-cde5-46c7-a6ee-5951c374923c
Peters, Emily S.
a5d5947f-031a-46dd-a38f-4d996a3ccea2
Parkin, Ivan P.
7f95b9c4-1f9d-441c-8d43-ac8ea2554b85
Manning, Troy D.
1dab9fe1-54df-4aff-b4db-455264d28af6
Hector, Andrew L.
f19a8f31-b37f-4474-b32a-b7cf05b9f0e5

Carmalt, Claire J., Peters, Emily S., Parkin, Ivan P., Manning, Troy D. and Hector, Andrew L. (2004) Chemical vapor deposition of niobium disulfide thin films. European Journal of Inorganic Chemistry, 2004 (22), 4470-4476. (doi:10.1002/ejic.200400308).

Record type: Article

Abstract

Atmospheric pressure chemical vapor deposition (APCVD) of niobium sulfide coatings was achieved on glass substrates from the reaction of NbCl5 and S(SiMe3)(2), tBu(2)S(2), tBuSH, or HSCH2CH2SH at 250-600degreesC. The niobium sulfide films grown at temperatures above 500degreesC were crystalline, and powder X-ray diffraction showed that two polytypes of NbS2 were produced. The sulfur precursor used is fundamental to the polytype of NbS2 obtained; films that are grown from the APCVD reaction of NbCl5 and S(SiMe3)(2) or tBu(2)S(2) at 500-600degreesC crystallize into the 1T structure, whereas those grown from the APCVD reaction of NbCl5 and tBuSH or HSCH2CH2SH at 500-600 degreesC crystallize into the 3R structure. Energy dispersive X-ray analysis (EDXA) studies gave elemental ratios close to the expected 1:2 ratio for Nb:S. Scanning electron microscopy (SEM) revealed surface morphologies consistent with an island growth mechanism. The films were also characterized using Raman and X-ray photoelectron spectroscopy, both of which showed differences consistent with the formation of the two polytypes, 1T and 3R-NbS2.

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More information

Published date: 19 November 2004
Keywords: niobium disulfide, thin films, chemical vapor deposition, optical-absorption, crystal-structure, nbs2, suspensions, 1t-tas2, phase, glass

Identifiers

Local EPrints ID: 20157
URI: https://eprints.soton.ac.uk/id/eprint/20157
ISSN: 1434-1948
PURE UUID: 848f37bb-43c4-4960-9f41-d7bcfc797fe2
ORCID for Andrew L. Hector: ORCID iD orcid.org/0000-0002-9964-2163

Catalogue record

Date deposited: 22 Feb 2006
Last modified: 20 Jul 2019 01:16

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Contributors

Author: Claire J. Carmalt
Author: Emily S. Peters
Author: Ivan P. Parkin
Author: Troy D. Manning

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