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Submicron patterning of DNA oligonucleotides on silicon

Record type: Article

The covalent attachment of DNA oligonucleotides onto crystalline silicon (100) surfaces, in patterns with submicron features, in a straightforward, two-step process is presented. UV light exposure of a hydrogen-terminated silicon (100) surface coated with alkenes functionalized with N-hydroxysuccinimide ester groups resulted in the covalent attachment of the alkene as a monolayer on the surface. Submicron-scale patterning of surfaces was achieved by illumination with an interference pattern obtained by the transmission of 248 nm excimer laser light through a phase mask. The N-hydroxysuccinimide ester surface acted as a template for the subsequent covalent attachment of aminohexyl-modified DNA-oligonucleotides. Oligonucleotide patterns, with feature sizes of 500 nm, were reliably produced over large areas. The patterned surfaces were characterized with atomic force microscopy, scanning electron microscopy, epifluorescence microscopy and ellipsometry. Complementary oligonucleotides were hybridized to the surface-attached oligonucleotides with a density of 7 x 10(12) DNA oligonucleotides per square centimetre. The method will offer much potential for the creation of nano- and micro-scale DNA biosensor devices in silicon.

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Yin, H.B., Brown, T., Wilkinson, J.S., Eason, R.W. and Melvin, T. (2004) Submicron patterning of DNA oligonucleotides on silicon Nucleic Acids Research, 32, (14), e118-[7pp]. (doi:10.1093/nar/gnh113).

More information

Published date: 1 August 2004
Keywords: self-assembled monolayers, surfaces, lithography, nanostructures, fabrication, microarrays, 1-alkenes, si(100), si(111), devices


Local EPrints ID: 20346
ISSN: 0305-1048
PURE UUID: 47615dd8-1320-470b-9094-5186c8476c32
ORCID for J.S. Wilkinson: ORCID iD
ORCID for R.W. Eason: ORCID iD

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Date deposited: 16 Feb 2006
Last modified: 17 Jul 2017 16:29

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Author: H.B. Yin
Author: T. Brown
Author: J.S. Wilkinson ORCID iD
Author: R.W. Eason ORCID iD
Author: T. Melvin

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