Role of silicon and boron-interstitial clusters in transient enhanced diffusion
Role of silicon and boron-interstitial clusters in transient enhanced diffusion
1566772745
61-72
Cowern, N.E.B.
d5f2073f-03d8-42bc-bf2d-e9024c7b15bf
Mannino, G.
6e3173a8-0ec0-4844-b247-4bd17bbdbe1c
Roozeboom, F.
4ef62cd9-9186-4ee3-a08e-05f68fa2318c
Van Berkum, J.G.M.
ec619329-3c94-4217-8a68-2e64f6c92f23
Colombeau, B.
3cd2d3b9-12d6-41bc-b9e2-064fa8414bb4
Claverie, A.
8a62fe63-c992-4c62-872b-5cce1ecf397c
2000
Cowern, N.E.B.
d5f2073f-03d8-42bc-bf2d-e9024c7b15bf
Mannino, G.
6e3173a8-0ec0-4844-b247-4bd17bbdbe1c
Roozeboom, F.
4ef62cd9-9186-4ee3-a08e-05f68fa2318c
Van Berkum, J.G.M.
ec619329-3c94-4217-8a68-2e64f6c92f23
Colombeau, B.
3cd2d3b9-12d6-41bc-b9e2-064fa8414bb4
Claverie, A.
8a62fe63-c992-4c62-872b-5cce1ecf397c
Cowern, N.E.B., Mannino, G., Roozeboom, F., Van Berkum, J.G.M., Colombeau, B. and Claverie, A.
(2000)
Role of silicon and boron-interstitial clusters in transient enhanced diffusion.
In,
Roozeboom, F., Gelpey, J.C., Ozturk, M.C., Reid, K. and Kwong, D.L.
(eds.)
Rapid Thermal and Other Short-Time Processing Technologies II,.
Pennington, USA.
Electrochemical Society, .
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Book Section
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Published date: 2000
Identifiers
Local EPrints ID: 21521
URI: http://eprints.soton.ac.uk/id/eprint/21521
ISBN: 1566772745
PURE UUID: 006d9656-772b-4af3-9720-5b72d8994891
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Date deposited: 19 Feb 2007
Last modified: 11 Dec 2021 14:32
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Contributors
Author:
N.E.B. Cowern
Author:
G. Mannino
Author:
F. Roozeboom
Author:
J.G.M. Van Berkum
Author:
B. Colombeau
Author:
A. Claverie
Editor:
F. Roozeboom
Editor:
J.C. Gelpey
Editor:
M.C. Ozturk
Editor:
K. Reid
Editor:
D.L. Kwong
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