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Role of silicon and boron-interstitial clusters in transient enhanced diffusion

Role of silicon and boron-interstitial clusters in transient enhanced diffusion
Role of silicon and boron-interstitial clusters in transient enhanced diffusion
1566772745
61-72
Electrochemical Society
Cowern, N.E.B.
d5f2073f-03d8-42bc-bf2d-e9024c7b15bf
Mannino, G.
6e3173a8-0ec0-4844-b247-4bd17bbdbe1c
Roozeboom, F.
4ef62cd9-9186-4ee3-a08e-05f68fa2318c
Van Berkum, J.G.M.
ec619329-3c94-4217-8a68-2e64f6c92f23
Colombeau, B.
3cd2d3b9-12d6-41bc-b9e2-064fa8414bb4
Claverie, A.
8a62fe63-c992-4c62-872b-5cce1ecf397c
Roozeboom, F.
Gelpey, J.C.
Ozturk, M.C.
Reid, K.
Kwong, D.L.
Cowern, N.E.B.
d5f2073f-03d8-42bc-bf2d-e9024c7b15bf
Mannino, G.
6e3173a8-0ec0-4844-b247-4bd17bbdbe1c
Roozeboom, F.
4ef62cd9-9186-4ee3-a08e-05f68fa2318c
Van Berkum, J.G.M.
ec619329-3c94-4217-8a68-2e64f6c92f23
Colombeau, B.
3cd2d3b9-12d6-41bc-b9e2-064fa8414bb4
Claverie, A.
8a62fe63-c992-4c62-872b-5cce1ecf397c
Roozeboom, F.
Gelpey, J.C.
Ozturk, M.C.
Reid, K.
Kwong, D.L.

Cowern, N.E.B., Mannino, G., Roozeboom, F., Van Berkum, J.G.M., Colombeau, B. and Claverie, A. (2000) Role of silicon and boron-interstitial clusters in transient enhanced diffusion. In, Roozeboom, F., Gelpey, J.C., Ozturk, M.C., Reid, K. and Kwong, D.L. (eds.) Rapid Thermal and Other Short-Time Processing Technologies II,. Pennington, USA. Electrochemical Society, pp. 61-72.

Record type: Book Section

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Published date: 2000

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Local EPrints ID: 21521
URI: http://eprints.soton.ac.uk/id/eprint/21521
ISBN: 1566772745
PURE UUID: 006d9656-772b-4af3-9720-5b72d8994891

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Date deposited: 19 Feb 2007
Last modified: 06 Nov 2018 17:31

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