Bonar, J.M., McGregor, B.M., Cowern, N.E.B., Dan, A.H., Cooke, G.A. and Willoughby, A.F.W.
Furnace and RTA injection of point defects into CVD grown B-doped Si and SiGe
In Materials Research Society Symposium Proceedings.
Materials Research Socciety. 6 pp, .
Full text not available from this repository.
The diffusion of B in Si and SiGe under the influence of point defect injection by Rapid Thermal Anneal (RTA) and conventional anneal is studied in this work.
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