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Diffusion studies of antimony and boron in Si and SiGe under point defect injections by Rapid Thermal Anneal

Record type: Conference or Workshop Item (Paper)

The effect of point defect injection on the diffusion of antimony and boron in silicon and silicon-germanium alloys has been studied by comparison of inert with injection diffusions. In this work, Sb and B in Si were used as control wafers to investigate Sb and B diffusion behavior in Si0.9Ge0.1. The point defect injection technique was carried out by rapid thermal annealing (RTA) Sb and B in Si and Si0.9Ge0.1 samples with the various surface coatings in either oxygen or ammonia atmospheres to inject either interstitial or vacancy defects. The diffusion profiles for as-grown and RTA annealed samples were measured by Secondary Ion Mass Spectrometry (SIMS). Diffusivities for B in Si and Si0.9Ge0.1 were obtained using computer simulations of the measured boron profiles for their annealed samples. Sb diffusion in Si and Si0.9Ge0.1 was found enhanced by vacancy injection and retarded by interstitial injection. The enhanced B diffusion in Si and Si0.9Ge0.1 was found by interstitial injection. These results confirm that Sb diffusion in Si0.9Ge0.1 is primarily dominated by vacancy-mediated mechanism, while B diffuses in Si0.9Ge0.1 by an interstitially mediated mechanism.

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Citation

Dan, A.H., Willoughby, A.F.W., Bonar, J.M. and McGregor, B.M. (2001) Diffusion studies of antimony and boron in Si and SiGe under point defect injections by Rapid Thermal Anneal At Proceedings of the Seventh Postgraduate Conference in Engineering Materials. 01 Jan 2000. 2 pp, pp. 17-18.

More information

Published date: 2001
Venue - Dates: Proceedings of the Seventh Postgraduate Conference in Engineering Materials, 2000-01-01 - 2000-01-01

Identifiers

Local EPrints ID: 21792
URI: http://eprints.soton.ac.uk/id/eprint/21792
PURE UUID: 3ecaaf2f-bad2-497b-944b-a5c6577d528c

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Date deposited: 28 Mar 2006
Last modified: 17 Jul 2017 16:25

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Contributors

Author: A.H. Dan
Author: A.F.W. Willoughby
Author: J.M. Bonar
Author: B.M. McGregor

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