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Improved test structures for the electrical measurement of feature size on an alternating aperture phase-shifting mask

Improved test structures for the electrical measurement of feature size on an alternating aperture phase-shifting mask
Improved test structures for the electrical measurement of feature size on an alternating aperture phase-shifting mask
Electrical test structures have been designed that are compatible with a standard alternating aperture, phase-shift mask manufacturing process. Measurements indicate that these have superior performance to previous designs where Greek cross structures suffered from asymmetry problems. As a result, the new test structures extract a consistent, and accurate, sheet resistance. In addition, the measurements on linewidth structures have demonstrated an improved capability with the CD offset variability being reduced to a quarter of the previous value. Electrical CD results from a wide range of test structures, both phase-shifted and binary, are presented and it is demonstrated that the phase-shifting elements have a negligible effect on the measurements. A limited number of atomic force microscope measurements have also been made for comparison purposes.
atomic force microscopy, electric resistance measurement, phase shifting masks, size measurement
17-22
IEEE
Smith, S.
8904521d-3b46-4112-8566-e08de3e011a5
Walton, A.J.
2ac47979-cc42-4acd-9828-ead8a7897e85
McCallum, M.
5b9a74e0-a30a-4fe5-90b0-085dcf1fa9e2
Hourd, A.C.
238c146d-be4e-47fe-be00-9ca3784e4d3b
Stevenson, J.T.M.
ef101cfb-680e-4583-96a9-0d149688938e
Ross, A.W.S.
f717a572-f6fe-4412-9682-8fbc80a4fbf1
Smith, S.
8904521d-3b46-4112-8566-e08de3e011a5
Walton, A.J.
2ac47979-cc42-4acd-9828-ead8a7897e85
McCallum, M.
5b9a74e0-a30a-4fe5-90b0-085dcf1fa9e2
Hourd, A.C.
238c146d-be4e-47fe-be00-9ca3784e4d3b
Stevenson, J.T.M.
ef101cfb-680e-4583-96a9-0d149688938e
Ross, A.W.S.
f717a572-f6fe-4412-9682-8fbc80a4fbf1

Smith, S., Walton, A.J., McCallum, M., Hourd, A.C., Stevenson, J.T.M. and Ross, A.W.S. (2005) Improved test structures for the electrical measurement of feature size on an alternating aperture phase-shifting mask. In Proceedings of the 2005 International Conference on Microelectronic Test Structures, 2005. ICMTS 2005. IEEE. pp. 17-22 .

Record type: Conference or Workshop Item (Paper)

Abstract

Electrical test structures have been designed that are compatible with a standard alternating aperture, phase-shift mask manufacturing process. Measurements indicate that these have superior performance to previous designs where Greek cross structures suffered from asymmetry problems. As a result, the new test structures extract a consistent, and accurate, sheet resistance. In addition, the measurements on linewidth structures have demonstrated an improved capability with the CD offset variability being reduced to a quarter of the previous value. Electrical CD results from a wide range of test structures, both phase-shifted and binary, are presented and it is demonstrated that the phase-shifting elements have a negligible effect on the measurements. A limited number of atomic force microscope measurements have also been made for comparison purposes.

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More information

Published date: 2005
Venue - Dates: International Conference on Microelectronic Test Structures. ICMTS 2005, Leuven, Belgium, 2005-04-04 - 2005-04-07
Keywords: atomic force microscopy, electric resistance measurement, phase shifting masks, size measurement

Identifiers

Local EPrints ID: 23538
URI: http://eprints.soton.ac.uk/id/eprint/23538
PURE UUID: c0ddeb7e-3821-4347-bb48-a1e0b0134a3c

Catalogue record

Date deposited: 29 Mar 2006
Last modified: 05 Mar 2024 17:38

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Contributors

Author: S. Smith
Author: A.J. Walton
Author: M. McCallum
Author: A.C. Hourd
Author: J.T.M. Stevenson
Author: A.W.S. Ross

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