Fluorination of carbon nanotubes in CF4 plasma
Fluorination of carbon nanotubes in CF4 plasma
The effect of CF4 gaseous plasma exposure to single-wall carbon nanotubes (CNTs) has been studied. Raman spectroscopy results show that CNTs have gained more disordered sp3 bonds associated with functionalization, as both the flow rates of gas in the plasma and exposure time in the plasma are increased. Scanning electron microscopy images indicate the CNTs have been preserved after CF4 plasma exposure. X-ray photoelectron spectroscopy provides evidence of carbon to fluorine bonds (C–F) on the CNTs samples after CF4 plasma exposure. Semi-ionic and covalent C–F bonds are prevalent on the CNTs after CF4 exposure with the intensity ratio of the semi-ionic to covalent C–F bond decreasing as the flow rate of CF4 and exposure time in the CF4 plasma is increased.
2426-2426
Plank, N.O.V.
b4b5fc7f-6622-4a69-aff6-714ed6ee3155
Jiang, Liudi
374f2414-51f0-418f-a316-e7db0d6dc4d1
Cheung, R.
45525b9d-cadc-486b-be31-ffc764a9b93e
2003
Plank, N.O.V.
b4b5fc7f-6622-4a69-aff6-714ed6ee3155
Jiang, Liudi
374f2414-51f0-418f-a316-e7db0d6dc4d1
Cheung, R.
45525b9d-cadc-486b-be31-ffc764a9b93e
Plank, N.O.V., Jiang, Liudi and Cheung, R.
(2003)
Fluorination of carbon nanotubes in CF4 plasma.
Applied Physics Letters, 83 (12), .
(doi:10.1063/1.161162).
Abstract
The effect of CF4 gaseous plasma exposure to single-wall carbon nanotubes (CNTs) has been studied. Raman spectroscopy results show that CNTs have gained more disordered sp3 bonds associated with functionalization, as both the flow rates of gas in the plasma and exposure time in the plasma are increased. Scanning electron microscopy images indicate the CNTs have been preserved after CF4 plasma exposure. X-ray photoelectron spectroscopy provides evidence of carbon to fluorine bonds (C–F) on the CNTs samples after CF4 plasma exposure. Semi-ionic and covalent C–F bonds are prevalent on the CNTs after CF4 exposure with the intensity ratio of the semi-ionic to covalent C–F bond decreasing as the flow rate of CF4 and exposure time in the CF4 plasma is increased.
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Published date: 2003
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Local EPrints ID: 23544
URI: http://eprints.soton.ac.uk/id/eprint/23544
ISSN: 0003-6951
PURE UUID: d29112d5-1473-4010-bf9e-e7012a588091
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Date deposited: 28 Mar 2006
Last modified: 16 Mar 2024 03:47
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Author:
N.O.V. Plank
Author:
R. Cheung
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