The effect of plasma etching on the electrical characteristics of 4H-SiC Schottky diodes


Plank, N.O.V., Jiang, Liudi, Gundlach, A.M. and Cheung, R., (2002) The effect of plasma etching on the electrical characteristics of 4H-SiC Schottky diodes Bergman, Peder and Janzén, Erik (eds.) In Silicon Carbide and Related Materials - 2002. Trans Tech., pp. 689-692.

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Item Type: Conference or Workshop Item (Paper)
Additional Information: Series ISSN 0255-5476. Conference paper: MoP3-16
ISBNs: 0878499202 (print)
Venue - Dates: ECSERM 2002: 4th European Conference on Silicon Carbide and Related Materials, 2002-09-01 - 2002-09-05
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ePrint ID: 23549
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2002Published
Date Deposited: 05 Jun 2006
Last Modified: 16 Apr 2017 22:44
Further Information:Google Scholar
URI: http://eprints.soton.ac.uk/id/eprint/23549

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