The effect of postdeposition annealing on chemical bonding in amorphous carbon nitride films prepared by DC magnetron sputtering.
The effect of postdeposition annealing on chemical bonding in amorphous carbon nitride films prepared by DC magnetron sputtering.
The effects of thermal annealing on the surface morphology, composition and chemical bond structure of amorphous carbon nitride (a-C:N) films deposited by dc magnetron sputtering are reported. Atomic force microscopy (AFM) results show that thermal annealing can gradually change the surface structure of the films from a cauliflower-like texture eventually to a uniform granular texture. Fourier transform infrared absorption (FTIR) spectroscopy and X-ray photoelectron spectroscopy (XPS) have been used to characterise the change of chemical bonding induced by annealing. By detailed analysis of both C 1s and N 1s photoelectron spectra, we have found that annealing can break the C---N bonds in the films and that the graphite-like C---N bonds are relatively more stable with the increase of anneal temperature.
carbon nitride, thermal annealing, XPS
331-338
Jiang, Liudi
374f2414-51f0-418f-a316-e7db0d6dc4d1
Fitzgerald, A.G.
a25c0ee4-638b-47b5-987e-cd8969e29345
Rose, M.J.
bd6c0b8a-1e4e-4ce8-be63-6c0bb1cc59a4
2001
Jiang, Liudi
374f2414-51f0-418f-a316-e7db0d6dc4d1
Fitzgerald, A.G.
a25c0ee4-638b-47b5-987e-cd8969e29345
Rose, M.J.
bd6c0b8a-1e4e-4ce8-be63-6c0bb1cc59a4
Jiang, Liudi, Fitzgerald, A.G. and Rose, M.J.
(2001)
The effect of postdeposition annealing on chemical bonding in amorphous carbon nitride films prepared by DC magnetron sputtering.
Applied Surface Science, 181 (3-4), .
(doi:10.1016/S0169-4332(01)00427-5).
Abstract
The effects of thermal annealing on the surface morphology, composition and chemical bond structure of amorphous carbon nitride (a-C:N) films deposited by dc magnetron sputtering are reported. Atomic force microscopy (AFM) results show that thermal annealing can gradually change the surface structure of the films from a cauliflower-like texture eventually to a uniform granular texture. Fourier transform infrared absorption (FTIR) spectroscopy and X-ray photoelectron spectroscopy (XPS) have been used to characterise the change of chemical bonding induced by annealing. By detailed analysis of both C 1s and N 1s photoelectron spectra, we have found that annealing can break the C---N bonds in the films and that the graphite-like C---N bonds are relatively more stable with the increase of anneal temperature.
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Published date: 2001
Keywords:
carbon nitride, thermal annealing, XPS
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Local EPrints ID: 23555
URI: http://eprints.soton.ac.uk/id/eprint/23555
ISSN: 0169-4332
PURE UUID: 1b2b9524-a561-4521-94a9-85309ed1888d
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Date deposited: 28 Mar 2006
Last modified: 16 Mar 2024 03:47
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Author:
A.G. Fitzgerald
Author:
M.J. Rose
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