Jiang, Liudi, Fitzgerald, A.G. and Rose, M.J.
The effect of postdeposition annealing on chemical bonding in amorphous carbon nitride films prepared by DC magnetron sputtering.
Applied Surface Science, 181, (3-4), . (doi:10.1016/S0169-4332(01)00427-5).
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The effects of thermal annealing on the surface morphology, composition and chemical bond structure of amorphous carbon nitride (a-C:N) films deposited by dc magnetron sputtering are reported. Atomic force microscopy (AFM) results show that thermal annealing can gradually change the surface structure of the films from a cauliflower-like texture eventually to a uniform granular texture. Fourier transform infrared absorption (FTIR) spectroscopy and X-ray photoelectron spectroscopy (XPS) have been used to characterise the change of chemical bonding induced by annealing. By detailed analysis of both C 1s and N 1s photoelectron spectra, we have found that annealing can break the C---N bonds in the films and that the graphite-like C---N bonds are relatively more stable with the increase of anneal temperature.
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