Selective and non-selective growth of self-aligned SiGe HBT structures by LPCVD epitaxy
Selective and non-selective growth of self-aligned SiGe HBT structures by LPCVD epitaxy
345-349
Bonar, J M
5ee6b25a-3e67-4a6d-9854-5e1e079d50b8
Schiz, J
d29b4f9e-f87d-445a-962b-db8de79f45a1
Ashburn, P
68cef6b7-205b-47aa-9efb-f1f09f5c1038
1999
Bonar, J M
5ee6b25a-3e67-4a6d-9854-5e1e079d50b8
Schiz, J
d29b4f9e-f87d-445a-962b-db8de79f45a1
Ashburn, P
68cef6b7-205b-47aa-9efb-f1f09f5c1038
Bonar, J M, Schiz, J and Ashburn, P
(1999)
Selective and non-selective growth of self-aligned SiGe HBT structures by LPCVD epitaxy.
Journal of Materials Science: Materials in Electronics, 10, .
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Published date: 1999
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 250912
URI: http://eprints.soton.ac.uk/id/eprint/250912
PURE UUID: 73e1e523-e716-466c-9a40-e66b968c8d0b
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Date deposited: 01 Oct 1999
Last modified: 08 Jan 2022 05:41
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Author:
J M Bonar
Author:
J Schiz
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