Marsh, C D, Moiseiwitsch, N E, Nash, G R, Booker, G R and Ashburn, P (1999) Enhanced oxide break up and polysilicon regrowth using fluorine and a methanol last wafer pre clean. Proceedings of the Microscopy of Semiconducting Materials Conference. pp. 477-480 .
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Conference or Workshop Item
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Published date: 1999
Venue - Dates:
Proceedings of the Microscopy of Semiconducting Materials Conference, 1999-01-01
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 250914
URI: http://eprints.soton.ac.uk/id/eprint/250914
PURE UUID: d8702c04-e9ab-4466-89d9-685b0e0d9405
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Date deposited: 04 Oct 1999
Last modified: 10 Dec 2021 20:19
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Contributors
Author:
C D Marsh
Author:
N E Moiseiwitsch
Author:
G R Nash
Author:
G R Booker
Author:
P Ashburn
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