Characterisation of the effects of transient enhanced diffusion in SiGe HBTs by a comparison of measured and 2D simulated device characteristics
Characterisation of the effects of transient enhanced diffusion in SiGe HBTs by a comparison of measured and 2D simulated device characteristics
0-7803-3916-9
96-99
Hashim, M D R
dc30dac8-eef1-44c7-a3af-5b01a27e61ea
Lever, R F
c9194e6d-c30f-41c6-b6c5-7bdc597acdf9
Ashburn, P
68cef6b7-205b-47aa-9efb-f1f09f5c1038
1997
Hashim, M D R
dc30dac8-eef1-44c7-a3af-5b01a27e61ea
Lever, R F
c9194e6d-c30f-41c6-b6c5-7bdc597acdf9
Ashburn, P
68cef6b7-205b-47aa-9efb-f1f09f5c1038
Hashim, M D R, Lever, R F and Ashburn, P
(1997)
Characterisation of the effects of transient enhanced diffusion in SiGe HBTs by a comparison of measured and 2D simulated device characteristics.
Proceedings of IEEE Bipolar/BiCMOS Circuits and Technology Meeting.
.
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Conference or Workshop Item
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Published date: 1997
Venue - Dates:
Proceedings of IEEE Bipolar/BiCMOS Circuits and Technology Meeting, 1997-01-01
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 250926
URI: http://eprints.soton.ac.uk/id/eprint/250926
ISBN: 0-7803-3916-9
PURE UUID: 6b8f7dac-53a7-4e03-b621-1f532ab70940
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Date deposited: 01 Oct 1999
Last modified: 10 Dec 2021 20:19
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Contributors
Author:
M D R Hashim
Author:
R F Lever
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