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Improved epitaxial quality following etch damage removal on plasma etched silicon surfaces

Record type: Conference or Workshop Item (Other)

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Citation

Bonar, J M, Schiz, J and Ashburn, P (1997) Improved epitaxial quality following etch damage removal on plasma etched silicon surfaces At Proceedings of Microscopy of Semiconducting Materials Conference. , pp. 407-410.

More information

Published date: 1997
Venue - Dates: Proceedings of Microscopy of Semiconducting Materials Conference, 1997-01-01
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 250927
URI: http://eprints.soton.ac.uk/id/eprint/250927
ISBN: 0-7503-0464-2
PURE UUID: 6308fcd1-1cb9-4480-9e97-49a93d7aa096

Catalogue record

Date deposited: 01 Oct 1999
Last modified: 18 Jul 2017 10:13

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Contributors

Author: J M Bonar
Author: J Schiz
Author: P Ashburn

University divisions


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