Improved epitaxial quality following etch damage removal on plasma etched silicon surfaces


Bonar, J M, Schiz, J and Ashburn, P (1997) Improved epitaxial quality following etch damage removal on plasma etched silicon surfaces At Proceedings of Microscopy of Semiconducting Materials Conference. , pp. 407-410.

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Item Type: Conference or Workshop Item (Other)
Venue - Dates: Proceedings of Microscopy of Semiconducting Materials Conference, 1997-01-01
Organisations: Nanoelectronics and Nanotechnology
ePrint ID: 250927
Date :
Date Event
1997Published
Date Deposited: 01 Oct 1999
Last Modified: 17 Apr 2017 23:47
Further Information:Google Scholar
URI: http://eprints.soton.ac.uk/id/eprint/250927

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