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The effects of fluorine on the epitaxial regrowth of arsenic doped amorphous silicon and polysilicon and of chlorine on the epitaxial regrowth of arsenic doped polysilicon

The effects of fluorine on the epitaxial regrowth of arsenic doped amorphous silicon and polysilicon and of chlorine on the epitaxial regrowth of arsenic doped polysilicon
The effects of fluorine on the epitaxial regrowth of arsenic doped amorphous silicon and polysilicon and of chlorine on the epitaxial regrowth of arsenic doped polysilicon
0-7503-0464-2
411-414
Marsh, C D
b5482357-2e75-49f8-8217-72e1fde37c9f
Moiseiwitsch, N E
3cca82f7-300c-4ef9-9298-f68d784d3735
Booker, G R
1c5cd067-0dc6-4cd7-9e2c-9adf8ae291e9
Ashburn, P
68cef6b7-205b-47aa-9efb-f1f09f5c1038
Marsh, C D
b5482357-2e75-49f8-8217-72e1fde37c9f
Moiseiwitsch, N E
3cca82f7-300c-4ef9-9298-f68d784d3735
Booker, G R
1c5cd067-0dc6-4cd7-9e2c-9adf8ae291e9
Ashburn, P
68cef6b7-205b-47aa-9efb-f1f09f5c1038

Marsh, C D, Moiseiwitsch, N E, Booker, G R and Ashburn, P (1997) The effects of fluorine on the epitaxial regrowth of arsenic doped amorphous silicon and polysilicon and of chlorine on the epitaxial regrowth of arsenic doped polysilicon. Proceedings of Microscopy of Semiconducting Materials Conference. pp. 411-414 .

Record type: Conference or Workshop Item (Other)

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More information

Published date: 1997
Venue - Dates: Proceedings of Microscopy of Semiconducting Materials Conference, 1997-01-01
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 250929
URI: http://eprints.soton.ac.uk/id/eprint/250929
ISBN: 0-7503-0464-2
PURE UUID: eef1243d-2a73-47d7-a6db-0cad3e316a75

Catalogue record

Date deposited: 01 Oct 1999
Last modified: 10 Dec 2021 20:19

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Contributors

Author: C D Marsh
Author: N E Moiseiwitsch
Author: G R Booker
Author: P Ashburn

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