Marsh, C D, Moiseiwitsch, N E, Booker, G R and Ashburn, P (1995) Expitaxial regrowth of As doped polysilicon at 850 Degrees C induced by fluorine and a pre-anneal.
Record type:
Other
This record has no associated files available for download.
More information
Published date: 1995
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 250938
URI: http://eprints.soton.ac.uk/id/eprint/250938
PURE UUID: 768094a1-7228-453a-ab0e-65ce7fe1491f
Catalogue record
Date deposited: 04 Oct 1999
Last modified: 10 Dec 2021 20:19
Export record
Download statistics
Downloads from ePrints over the past year. Other digital versions may also be available to download e.g. from the publisher's website.