Bonar, J M, Parker, G J, Hamel, J S and Ashburn, P (1994) LPCVD growth of SiGe for device applications.
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Published date: 1994
Organisations:
Nanoelectronics and Nanotechnology
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Local EPrints ID: 250945
URI: http://eprints.soton.ac.uk/id/eprint/250945
PURE UUID: d498643d-c2c4-498c-8f05-6251940978a9
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Date deposited: 04 Oct 1999
Last modified: 10 Dec 2021 20:19
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