LPCVD growth of SiGe for device applications


Bonar, J M, Parker, G J, Hamel, J S and Ashburn, P (1994) LPCVD growth of SiGe for device applications

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Item Type: Other
Organisations: Nanoelectronics and Nanotechnology
ePrint ID: 250945
Date :
Date Event
1994Published
Date Deposited: 04 Oct 1999
Last Modified: 17 Apr 2017 23:46
Further Information:Google Scholar
URI: http://eprints.soton.ac.uk/id/eprint/250945

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