Optimisation of BF2 implanted pnp polysilicon emitter bipolar transistors using rapid thermal annealing
Optimisation of BF2 implanted pnp polysilicon emitter bipolar transistors using rapid thermal annealing
Moiseiwitsch, N E
3cca82f7-300c-4ef9-9298-f68d784d3735
Ashburn, P
68cef6b7-205b-47aa-9efb-f1f09f5c1038
1993
Moiseiwitsch, N E
3cca82f7-300c-4ef9-9298-f68d784d3735
Ashburn, P
68cef6b7-205b-47aa-9efb-f1f09f5c1038
Moiseiwitsch, N E and Ashburn, P
(1993)
Optimisation of BF2 implanted pnp polysilicon emitter bipolar transistors using rapid thermal annealing.
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Published date: 1993
Additional Information:
Organisation: ESSDERC
Organisations:
Nanoelectronics and Nanotechnology
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Local EPrints ID: 250962
URI: http://eprints.soton.ac.uk/id/eprint/250962
PURE UUID: a844116a-8e81-4ba0-a0c6-530834bcca0d
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Date deposited: 05 Oct 1999
Last modified: 03 Jan 2024 16:13
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Author:
N E Moiseiwitsch
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