Amaratunga, G A J, Sabine, K A and Evans, A G R (1985) Modelling of ion implantation in a three layer structures using the method of dose matching.
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Published date: September 1985
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 250993
URI: http://eprints.soton.ac.uk/id/eprint/250993
PURE UUID: 758642b5-921f-4c24-b86a-938b4f27c72c
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Date deposited: 08 Oct 1999
Last modified: 10 Dec 2021 20:19
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Contributors
Author:
G A J Amaratunga
Author:
K A Sabine
Author:
A G R Evans
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