Modelling of ion implantation in a three layer structures using the method of dose matching


Amaratunga, G A J, Sabine, K A and Evans, A G R (1985) Modelling of ion implantation in a three layer structures using the method of dose matching

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Item Type: Other
Organisations: Nanoelectronics and Nanotechnology
ePrint ID: 250993
Date :
Date Event
September 1985Published
Date Deposited: 08 Oct 1999
Last Modified: 17 Apr 2017 23:46
Further Information:Google Scholar
URI: http://eprints.soton.ac.uk/id/eprint/250993

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