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Implantation dominated unction depths of low temperature and electron beam annealed As source/drain Regions

Implantation dominated unction depths of low temperature and electron beam annealed As source/drain Regions
Implantation dominated unction depths of low temperature and electron beam annealed As source/drain Regions
Amaratunga, G A J
1167e3a3-ff00-4a7f-92a5-06a2f22c6b5f
Knee, N D
d7a57b0f-e758-4307-b1d5-8f7a4f989c56
Hart, M J
e4833057-eb19-44aa-9b1c-c86de054a920
Evans, A G R
c4a3f208-8fd9-491d-870f-ce7eef943311
Amaratunga, G A J
1167e3a3-ff00-4a7f-92a5-06a2f22c6b5f
Knee, N D
d7a57b0f-e758-4307-b1d5-8f7a4f989c56
Hart, M J
e4833057-eb19-44aa-9b1c-c86de054a920
Evans, A G R
c4a3f208-8fd9-491d-870f-ce7eef943311

Amaratunga, G A J, Knee, N D, Hart, M J and Evans, A G R (1987) Implantation dominated unction depths of low temperature and electron beam annealed As source/drain Regions.

Record type: Other

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More information

Published date: 1987
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 251004
URI: https://eprints.soton.ac.uk/id/eprint/251004
PURE UUID: bd407a01-4b7a-4170-a4b6-134cf1c3215a

Catalogue record

Date deposited: 11 Oct 1999
Last modified: 18 Jul 2017 10:13

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