Amaratunga, G A J, Knee, N D, Hart, M J and Evans, A G R (1987) Implantation dominated unction depths of low temperature and electron beam annealed As source/drain Regions.
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Published date: 1987
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 251004
URI: http://eprints.soton.ac.uk/id/eprint/251004
PURE UUID: bd407a01-4b7a-4170-a4b6-134cf1c3215a
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Date deposited: 11 Oct 1999
Last modified: 10 Dec 2021 20:19
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Contributors
Author:
G A J Amaratunga
Author:
N D Knee
Author:
M J Hart
Author:
A G R Evans
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