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Polysilicon emitter bipolar transistors fabricated by rapid thermal processing

Polysilicon emitter bipolar transistors fabricated by rapid thermal processing
Polysilicon emitter bipolar transistors fabricated by rapid thermal processing
Post, I R C
20c72d45-7b72-4df1-a487-a23f6b06511e
Ashburn, P
68cef6b7-205b-47aa-9efb-f1f09f5c1038
Williams, J D
99868e32-58be-4644-b8e1-e6fc4fdceedb
Moiseiwitsch, N E
3cca82f7-300c-4ef9-9298-f68d784d3735
Jerome, R C
582ee7bf-c424-4508-8ab8-da71670043f2
Post, I R C
20c72d45-7b72-4df1-a487-a23f6b06511e
Ashburn, P
68cef6b7-205b-47aa-9efb-f1f09f5c1038
Williams, J D
99868e32-58be-4644-b8e1-e6fc4fdceedb
Moiseiwitsch, N E
3cca82f7-300c-4ef9-9298-f68d784d3735
Jerome, R C
582ee7bf-c424-4508-8ab8-da71670043f2

Post, I R C, Ashburn, P, Williams, J D, Moiseiwitsch, N E and Jerome, R C (1993) Polysilicon emitter bipolar transistors fabricated by rapid thermal processing.

Record type: Other

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More information

Published date: 1993
Additional Information: Organisation: IEEE
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 251020
URI: http://eprints.soton.ac.uk/id/eprint/251020
PURE UUID: a425d320-a048-4b95-bfb8-bf6c61909ae0

Catalogue record

Date deposited: 11 Oct 1999
Last modified: 10 Dec 2021 20:19

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Contributors

Author: I R C Post
Author: P Ashburn
Author: J D Williams
Author: N E Moiseiwitsch
Author: R C Jerome

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