Nanu, L and Evans, A G R (1999) Phosphorus diffusion in silicon during rapid thermal annealing.
Record type:
Other
This record has no associated files available for download.
More information
Published date: 11 October 1999
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 251021
URI: http://eprints.soton.ac.uk/id/eprint/251021
PURE UUID: 5dac0125-ee5b-44fe-9ce7-685b93f5168b
Catalogue record
Date deposited: 11 Oct 1999
Last modified: 29 Jan 2020 15:05
Export record
Contributors
Author:
L Nanu
Author:
A G R Evans
Download statistics
Downloads from ePrints over the past year. Other digital versions may also be available to download e.g. from the publisher's website.