Atrip, J L, Evans, A G R, Logan, J R and Jeynes, C (1990) High temperature millisecond annealing of arsenic implanted silicon.
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Published date: 1990
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 251028
URI: http://eprints.soton.ac.uk/id/eprint/251028
PURE UUID: 51b14f5f-65d3-443f-bdf3-5aa4273a97b7
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Date deposited: 11 Oct 1999
Last modified: 10 Dec 2021 20:19
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Contributors
Author:
J L Atrip
Author:
A G R Evans
Author:
J R Logan
Author:
C Jeynes
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