Carter, J C, Evans, A G R, Timans, P J and England, J M C (1999) Millisecond annealing for complementary metal-oxide semiconductor source and drain implants.
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Published date: 11 October 1999
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 251033
URI: http://eprints.soton.ac.uk/id/eprint/251033
PURE UUID: acf32422-216e-44c9-aa0f-98580fd0a133
Catalogue record
Date deposited: 11 Oct 1999
Last modified: 29 Jan 2020 15:05
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Contributors
Author:
J C Carter
Author:
A G R Evans
Author:
P J Timans
Author:
J M C England
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