Anomalous Electrical deactivation of low concentration rapid thermally annealed arsenic implanted silicon
Anomalous Electrical deactivation of low concentration rapid thermally annealed arsenic implanted silicon
Altrip, J L
17142133-bd7b-47ec-8fe7-42d39fad5f2b
Evans, A G R
c4a3f208-8fd9-491d-870f-ce7eef943311
1992
Altrip, J L
17142133-bd7b-47ec-8fe7-42d39fad5f2b
Evans, A G R
c4a3f208-8fd9-491d-870f-ce7eef943311
Altrip, J L and Evans, A G R
(1992)
Anomalous Electrical deactivation of low concentration rapid thermally annealed arsenic implanted silicon.
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Published date: 1992
Additional Information:
Proceedings of 22 European Solid State Device Research Conference published in Microelectronic Engineering.
Organisations:
Nanoelectronics and Nanotechnology
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Local EPrints ID: 251052
URI: http://eprints.soton.ac.uk/id/eprint/251052
PURE UUID: fc6f8491-baa9-4f3c-bdf9-c4c5325979f8
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Date deposited: 11 Oct 1999
Last modified: 10 Dec 2021 20:19
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Author:
J L Altrip
Author:
A G R Evans
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