Selective silicon epitaxial growth by LPCVD using silane
Selective silicon epitaxial growth by LPCVD using silane
Parker, Dr G J
c3f9f069-0b6a-424c-8192-968ab6c90edc
Starbuck, C M K
a85acc65-f4ee-46aa-a608-817d9993f8fd
June 1990
Parker, Dr G J
c3f9f069-0b6a-424c-8192-968ab6c90edc
Starbuck, C M K
a85acc65-f4ee-46aa-a608-817d9993f8fd
Parker, Dr G J and Starbuck, C M K
(1990)
Selective silicon epitaxial growth by LPCVD using silane.
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More information
Published date: June 1990
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 251056
URI: http://eprints.soton.ac.uk/id/eprint/251056
PURE UUID: df988c52-c82e-47ac-ba6f-14e165bc455b
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Date deposited: 11 Oct 1999
Last modified: 10 Dec 2021 20:19
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Contributors
Author:
Dr G J Parker
Author:
C M K Starbuck
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