Use of a gate delay expression to compare self-aligned silicon bipolar and AlGaAs/GaAs heterojunction bipolar technologies
Use of a gate delay expression to compare self-aligned silicon bipolar and AlGaAs/GaAs heterojunction bipolar technologies
Ashburn, P
68cef6b7-205b-47aa-9efb-f1f09f5c1038
Rezazadeh, A A
23167ca0-a461-4ba6-bfe6-5ec47b13ad20
Chor, E F
66328b6e-8b0f-412e-b94c-8d858baf222d
Brunnschweiler, A
2d39ef7c-b95e-476c-b435-316b6618a565
1988
Ashburn, P
68cef6b7-205b-47aa-9efb-f1f09f5c1038
Rezazadeh, A A
23167ca0-a461-4ba6-bfe6-5ec47b13ad20
Chor, E F
66328b6e-8b0f-412e-b94c-8d858baf222d
Brunnschweiler, A
2d39ef7c-b95e-476c-b435-316b6618a565
Ashburn, P, Rezazadeh, A A, Chor, E F and Brunnschweiler, A
(1988)
Use of a gate delay expression to compare self-aligned silicon bipolar and AlGaAs/GaAs heterojunction bipolar technologies.
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Published date: 1988
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 251860
URI: http://eprints.soton.ac.uk/id/eprint/251860
PURE UUID: d376d4ec-ff6a-479b-b00d-8af6707e1aa4
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Date deposited: 12 Nov 1999
Last modified: 10 Dec 2021 20:23
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Contributors
Author:
A A Rezazadeh
Author:
E F Chor
Author:
A Brunnschweiler
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