Implantation and diffusion models for arsenic
Implantation and diffusion models for arsenic
Amaratunga, G A J
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Knee, N
c9cca158-18f6-4204-8352-3e02c072e409
Hart, M J
e4833057-eb19-44aa-9b1c-c86de054a920
Evans, A G R
c4a3f208-8fd9-491d-870f-ce7eef943311
October 1985
Amaratunga, G A J
1167e3a3-ff00-4a7f-92a5-06a2f22c6b5f
Knee, N
c9cca158-18f6-4204-8352-3e02c072e409
Hart, M J
e4833057-eb19-44aa-9b1c-c86de054a920
Evans, A G R
c4a3f208-8fd9-491d-870f-ce7eef943311
Amaratunga, G A J, Knee, N, Hart, M J and Evans, A G R
(1985)
Implantation and diffusion models for arsenic.
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Published date: October 1985
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 252029
URI: http://eprints.soton.ac.uk/id/eprint/252029
PURE UUID: 1a6f1e48-0c1d-4a80-bef6-4e4f7a5aa778
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Date deposited: 30 Nov 1999
Last modified: 10 Dec 2021 20:24
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Contributors
Author:
G A J Amaratunga
Author:
N Knee
Author:
M J Hart
Author:
A G R Evans
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