Altrip, J L, Evans, A G R, Hart, M J, Amaratunga, G A J and Kijek, M (1988) Diffusion and activation studies of rapid thermally annealed arsenic implanted silicon.
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Published date: July 1988
Additional Information:
Address: Swansea
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 252038
URI: http://eprints.soton.ac.uk/id/eprint/252038
PURE UUID: 8a3c2c2e-24ca-404b-a326-5ed897d02a23
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Date deposited: 30 Nov 1999
Last modified: 10 Dec 2021 20:24
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Contributors
Author:
J L Altrip
Author:
A G R Evans
Author:
M J Hart
Author:
G A J Amaratunga
Author:
M Kijek
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