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Diffusion and activation studies of rapid thermally annealed arsenic implanted silicon

Altrip, J L, Evans, A G R, Hart, M J, Amaratunga, G A J and Kijek, M (1988) Diffusion and activation studies of rapid thermally annealed arsenic implanted silicon

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Published date: July 1988
Additional Information: Address: Swansea
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 252038
URI: http://eprints.soton.ac.uk/id/eprint/252038
PURE UUID: 8a3c2c2e-24ca-404b-a326-5ed897d02a23

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Date deposited: 30 Nov 1999
Last modified: 18 Jul 2017 10:07

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Contributors

Author: J L Altrip
Author: A G R Evans
Author: M J Hart
Author: G A J Amaratunga
Author: M Kijek

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