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Diffusion and activation studies of rapid thermally annealed arsenic implanted silicon

Diffusion and activation studies of rapid thermally annealed arsenic implanted silicon
Diffusion and activation studies of rapid thermally annealed arsenic implanted silicon
Altrip, J L
17142133-bd7b-47ec-8fe7-42d39fad5f2b
Evans, A G R
c4a3f208-8fd9-491d-870f-ce7eef943311
Hart, M J
e4833057-eb19-44aa-9b1c-c86de054a920
Amaratunga, G A J
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Kijek, M
70ea715b-f171-4391-8460-0c58e4c94b8b
Altrip, J L
17142133-bd7b-47ec-8fe7-42d39fad5f2b
Evans, A G R
c4a3f208-8fd9-491d-870f-ce7eef943311
Hart, M J
e4833057-eb19-44aa-9b1c-c86de054a920
Amaratunga, G A J
1167e3a3-ff00-4a7f-92a5-06a2f22c6b5f
Kijek, M
70ea715b-f171-4391-8460-0c58e4c94b8b

Altrip, J L, Evans, A G R, Hart, M J, Amaratunga, G A J and Kijek, M (1988) Diffusion and activation studies of rapid thermally annealed arsenic implanted silicon.

Record type: Other

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More information

Published date: July 1988
Additional Information: Address: Swansea
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 252038
URI: https://eprints.soton.ac.uk/id/eprint/252038
PURE UUID: 8a3c2c2e-24ca-404b-a326-5ed897d02a23

Catalogue record

Date deposited: 30 Nov 1999
Last modified: 18 Jul 2017 10:07

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Contributors

Author: J L Altrip
Author: A G R Evans
Author: M J Hart
Author: G A J Amaratunga
Author: M Kijek

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