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Towards the limit of Ion Implantation and rapid thermal annealing as a technique for shallow junction formation

Towards the limit of Ion Implantation and rapid thermal annealing as a technique for shallow junction formation
Towards the limit of Ion Implantation and rapid thermal annealing as a technique for shallow junction formation
Altrip, J L
17142133-bd7b-47ec-8fe7-42d39fad5f2b
Evans, A G R
c4a3f208-8fd9-491d-870f-ce7eef943311
Logan, J R
e063eb71-9553-4776-b7a6-73a1e2c52003
Jeynes, C
838ab9ab-998e-4eb0-ab12-89fc97df3caf
Altrip, J L
17142133-bd7b-47ec-8fe7-42d39fad5f2b
Evans, A G R
c4a3f208-8fd9-491d-870f-ce7eef943311
Logan, J R
e063eb71-9553-4776-b7a6-73a1e2c52003
Jeynes, C
838ab9ab-998e-4eb0-ab12-89fc97df3caf

Altrip, J L, Evans, A G R, Logan, J R and Jeynes, C (1990) Towards the limit of Ion Implantation and rapid thermal annealing as a technique for shallow junction formation.

Record type: Other

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More information

Published date: 1990
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 252074
URI: https://eprints.soton.ac.uk/id/eprint/252074
PURE UUID: 51a41126-be0a-415f-b10a-a8f26faf5efc

Catalogue record

Date deposited: 09 Dec 1999
Last modified: 18 Jul 2017 10:07

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