Altrip, J L, Evans, A G R, Logan, J R and Jeynes, C (1990) Towards the limit of Ion Implantation and rapid thermal annealing as a technique for shallow junction formation.
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Published date: 1990
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 252074
URI: http://eprints.soton.ac.uk/id/eprint/252074
PURE UUID: 51a41126-be0a-415f-b10a-a8f26faf5efc
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Date deposited: 09 Dec 1999
Last modified: 10 Dec 2021 20:24
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Contributors
Author:
J L Altrip
Author:
A G R Evans
Author:
J R Logan
Author:
C Jeynes
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