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Polysilicon Microstructures

Polysilicon Microstructures
Polysilicon Microstructures
The sacrificial etch technology for fabricating free-standing three-dimensional microstructures in polysilicon has been successfully implemented. A variety of techniques for reducing the intrinsic compressive stress have been employed in fabricating low stress structures. Low-temperature-deposited microcrystalline polysilicon and polysilicon deposited over doped oxide were found to have low intrinsic stress, without additional annealing. A simple technique for obtaining additional compliance in diaphragms is described. Anisotropically etched submicron fibers and plastically deformed polysilicon shells are some of the unusual devices that have been obtained
IEEE
Farooqui, M M
1c0f9c64-a0a1-4759-a5de-492f142547ae
Evans, A G R
c4a3f208-8fd9-491d-870f-ce7eef943311
Farooqui, M M
1c0f9c64-a0a1-4759-a5de-492f142547ae
Evans, A G R
c4a3f208-8fd9-491d-870f-ce7eef943311

Farooqui, M M and Evans, A G R (1991) Polysilicon Microstructures. In Proceedings of the IEEE Micro Electro Mechanical Systems: An Investigation of Micro Structures, Sensors, Actuators, Machines and Robots. IEEE.. (doi:10.1109/MEMSYS.1991.114793).

Record type: Conference or Workshop Item (Paper)

Abstract

The sacrificial etch technology for fabricating free-standing three-dimensional microstructures in polysilicon has been successfully implemented. A variety of techniques for reducing the intrinsic compressive stress have been employed in fabricating low stress structures. Low-temperature-deposited microcrystalline polysilicon and polysilicon deposited over doped oxide were found to have low intrinsic stress, without additional annealing. A simple technique for obtaining additional compliance in diaphragms is described. Anisotropically etched submicron fibers and plastically deformed polysilicon shells are some of the unusual devices that have been obtained

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More information

Published date: 1991
Additional Information: Address: Nara, Japan
Venue - Dates: IEEE Micro Electro Mechanical Systems, Nara, Japan, 1991-01-30 - 1991-02-02
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 252076
URI: https://eprints.soton.ac.uk/id/eprint/252076
PURE UUID: 395c2adb-5a89-4d8a-94f0-d63e7f70c1b5

Catalogue record

Date deposited: 09 Dec 1999
Last modified: 03 Oct 2019 16:30

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