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The nature of Electrically inactive implanted arsenic in Silicon after rapid thermal annealing

Record type: Other

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Citation

Altrip, J L, Evans, A G R, Young, N D and Logan, J R (1991) The nature of Electrically inactive implanted arsenic in Silicon after rapid thermal annealing

More information

Published date: 1991
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 252244
URI: http://eprints.soton.ac.uk/id/eprint/252244
PURE UUID: 111c095f-6efd-442a-99a6-8315300137b5

Catalogue record

Date deposited: 07 Jan 2000
Last modified: 18 Jul 2017 10:05

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Contributors

Author: J L Altrip
Author: A G R Evans
Author: N D Young
Author: J R Logan

University divisions


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