Afshar-Nanaii, N, Evans, A G R and Starbuck, C M K (1992) Submicron CMOS devices utilising selective epitaxial (SEG) of silicon using silane only.
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More information
Published date: September 1992
Additional Information:
ESSDERC. Address: Leuven
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 252246
URI: http://eprints.soton.ac.uk/id/eprint/252246
PURE UUID: 66df2c82-7962-4532-9040-bfcc0d32c93f
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Date deposited: 10 Jan 2000
Last modified: 07 Dec 2023 18:01
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Contributors
Author:
N Afshar-Nanaii
Author:
A G R Evans
Author:
C M K Starbuck
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