High aspect Ratio Sub-micron Pillars Fabricated by Photo Assisted Electrochemical Etching and Oxidation
High aspect Ratio Sub-micron Pillars Fabricated by Photo Assisted Electrochemical Etching and Oxidation
Lau, H W
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Parker, G J
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Greef, R
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Holling, M
def7fc70-725f-490b-ba7e-c67c469ffeb9
September 1995
Lau, H W
f46d11d1-e34a-4781-8054-7a3a3d56eec6
Parker, G J
b140c5a5-94c4-44f3-95a3-c5054a9fe38d
Greef, R
cf0cf06a-b969-4289-98fd-94c4fd0ce2b9
Holling, M
def7fc70-725f-490b-ba7e-c67c469ffeb9
Lau, H W, Parker, G J, Greef, R and Holling, M
(1995)
High aspect Ratio Sub-micron Pillars Fabricated by Photo Assisted Electrochemical Etching and Oxidation.
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Published date: September 1995
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 252430
URI: http://eprints.soton.ac.uk/id/eprint/252430
PURE UUID: 30bc95f6-a52d-47d7-9abf-b0a04ed1357e
Catalogue record
Date deposited: 27 Jan 2000
Last modified: 10 Dec 2021 20:27
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Contributors
Author:
H W Lau
Author:
G J Parker
Author:
R Greef
Author:
M Holling
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