High aspect Ratio Sub-micron Pillars Fabricated by Photo Assisted Electrochemical Etching and Oxidation


Lau, H W, Parker, G J, Greef, R and Holling, M (1995) High aspect Ratio Sub-micron Pillars Fabricated by Photo Assisted Electrochemical Etching and Oxidation

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Item Type: Other
Organisations: Nanoelectronics and Nanotechnology
ePrint ID: 252430
Date :
Date Event
September 1995Published
Date Deposited: 27 Jan 2000
Last Modified: 17 Apr 2017 23:33
Further Information:Google Scholar
URI: http://eprints.soton.ac.uk/id/eprint/252430

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