High-Aspect ratio silicon pillars fabricated by electrochemical etching and oxidation of macroporous silicon
High-Aspect ratio silicon pillars fabricated by electrochemical etching and oxidation of macroporous silicon
Lau, H W
f46d11d1-e34a-4781-8054-7a3a3d56eec6
Parker, G J
b140c5a5-94c4-44f3-95a3-c5054a9fe38d
Greef, R
cf0cf06a-b969-4289-98fd-94c4fd0ce2b9
1996
Lau, H W
f46d11d1-e34a-4781-8054-7a3a3d56eec6
Parker, G J
b140c5a5-94c4-44f3-95a3-c5054a9fe38d
Greef, R
cf0cf06a-b969-4289-98fd-94c4fd0ce2b9
Lau, H W, Parker, G J and Greef, R
(1996)
High-Aspect ratio silicon pillars fabricated by electrochemical etching and oxidation of macroporous silicon.
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Published date: 1996
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 252489
URI: http://eprints.soton.ac.uk/id/eprint/252489
PURE UUID: 6a6a823f-66ec-4d21-ab30-5165e1526ed7
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Date deposited: 31 Jan 2000
Last modified: 08 Jan 2022 11:44
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Contributors
Author:
H W Lau
Author:
G J Parker
Author:
R Greef
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