Nanofabrication of advanced waveguide structures incorporating a visible photonic band gap
Nanofabrication of advanced waveguide structures incorporating a visible photonic band gap
In this paper, we present the nanofabrication of novel semiconductor waveguide devices incorporating a photonic band structure within the guiding core layer. Our devices are based on a two-dimensional triangular array of air holes etched through the cladding and core layers of a blanket silicon nitride waveguide. These are then micromachined to create unusual pore profiles with features as small as 30 nm. We demonstrate a polarization dependent photonic band gap in the visible region of the spectrum.
172-176
Charlton, M.D.B.
fcf86ab0-8f34-411a-b576-4f684e51e274
Parker, G.J.
b140c5a5-94c4-44f3-95a3-c5054a9fe38d
June 1998
Charlton, M.D.B.
fcf86ab0-8f34-411a-b576-4f684e51e274
Parker, G.J.
b140c5a5-94c4-44f3-95a3-c5054a9fe38d
Charlton, M.D.B. and Parker, G.J.
(1998)
Nanofabrication of advanced waveguide structures incorporating a visible photonic band gap.
Journal of Micromechanics and Microengineering, 8 (2), .
(doi:10.1088/0960-1317/8/2/033).
Abstract
In this paper, we present the nanofabrication of novel semiconductor waveguide devices incorporating a photonic band structure within the guiding core layer. Our devices are based on a two-dimensional triangular array of air holes etched through the cladding and core layers of a blanket silicon nitride waveguide. These are then micromachined to create unusual pore profiles with features as small as 30 nm. We demonstrate a polarization dependent photonic band gap in the visible region of the spectrum.
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Published date: June 1998
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 252537
URI: http://eprints.soton.ac.uk/id/eprint/252537
ISSN: 1361-6439
PURE UUID: ed6f49d0-bc28-452b-a34c-3785165b80d2
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Date deposited: 14 Feb 2000
Last modified: 15 Mar 2024 23:13
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Author:
M.D.B. Charlton
Author:
G.J. Parker
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