Hart, M J, Evans, A G R and Amaratunga, G A J (1986) Non equilibrium effects during RTA of Boron and Arsenic implants in silicon.
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Published date: 1986
Additional Information:
Alvey Club meeting on process and Device Modelling. Address: Edinburgh
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 252672
URI: http://eprints.soton.ac.uk/id/eprint/252672
PURE UUID: 7ccb98ec-09c0-4a4b-af8a-606a6de5de9f
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Date deposited: 10 Mar 2000
Last modified: 10 Dec 2021 20:28
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Contributors
Author:
M J Hart
Author:
A G R Evans
Author:
G A J Amaratunga
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