Diffusion measurements and modelling of arsenic in silicon after scanning electron beam annealing
Diffusion measurements and modelling of arsenic in silicon after scanning electron beam annealing
Abstracts pp8-11
Hart, M J
e4833057-eb19-44aa-9b1c-c86de054a920
Evans, A G R
c4a3f208-8fd9-491d-870f-ce7eef943311
Amaratunga, G A J
1167e3a3-ff00-4a7f-92a5-06a2f22c6b5f
Altrip, J L
17142133-bd7b-47ec-8fe7-42d39fad5f2b
Kijek, M
70ea715b-f171-4391-8460-0c58e4c94b8b
October 1987
Hart, M J
e4833057-eb19-44aa-9b1c-c86de054a920
Evans, A G R
c4a3f208-8fd9-491d-870f-ce7eef943311
Amaratunga, G A J
1167e3a3-ff00-4a7f-92a5-06a2f22c6b5f
Altrip, J L
17142133-bd7b-47ec-8fe7-42d39fad5f2b
Kijek, M
70ea715b-f171-4391-8460-0c58e4c94b8b
Hart, M J, Evans, A G R, Amaratunga, G A J, Altrip, J L and Kijek, M
(1987)
Diffusion measurements and modelling of arsenic in silicon after scanning electron beam annealing.
Abstract
Abstracts pp8-11
This record has no associated files available for download.
More information
Published date: October 1987
Additional Information:
Alvey Club meeting.
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 252673
URI: http://eprints.soton.ac.uk/id/eprint/252673
PURE UUID: 22ff4708-e110-4e17-ac6c-631c18237448
Catalogue record
Date deposited: 10 Mar 2000
Last modified: 10 Dec 2021 20:28
Export record
Contributors
Author:
M J Hart
Author:
A G R Evans
Author:
G A J Amaratunga
Author:
J L Altrip
Author:
M Kijek
Download statistics
Downloads from ePrints over the past year. Other digital versions may also be available to download e.g. from the publisher's website.
View more statistics