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Diffusion measurements and modelling of arsenic in silicon after scanning electron beam annealing

Diffusion measurements and modelling of arsenic in silicon after scanning electron beam annealing
Diffusion measurements and modelling of arsenic in silicon after scanning electron beam annealing
Abstracts pp8-11
Hart, M J
e4833057-eb19-44aa-9b1c-c86de054a920
Evans, A G R
c4a3f208-8fd9-491d-870f-ce7eef943311
Amaratunga, G A J
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Altrip, J L
17142133-bd7b-47ec-8fe7-42d39fad5f2b
Kijek, M
70ea715b-f171-4391-8460-0c58e4c94b8b
Hart, M J
e4833057-eb19-44aa-9b1c-c86de054a920
Evans, A G R
c4a3f208-8fd9-491d-870f-ce7eef943311
Amaratunga, G A J
1167e3a3-ff00-4a7f-92a5-06a2f22c6b5f
Altrip, J L
17142133-bd7b-47ec-8fe7-42d39fad5f2b
Kijek, M
70ea715b-f171-4391-8460-0c58e4c94b8b

Hart, M J, Evans, A G R, Amaratunga, G A J, Altrip, J L and Kijek, M (1987) Diffusion measurements and modelling of arsenic in silicon after scanning electron beam annealing.

Record type: Other

Abstract

Abstracts pp8-11

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More information

Published date: October 1987
Additional Information: Alvey Club meeting.
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 252673
URI: http://eprints.soton.ac.uk/id/eprint/252673
PURE UUID: 22ff4708-e110-4e17-ac6c-631c18237448

Catalogue record

Date deposited: 10 Mar 2000
Last modified: 10 Dec 2021 20:28

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Contributors

Author: M J Hart
Author: A G R Evans
Author: G A J Amaratunga
Author: J L Altrip
Author: M Kijek

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