Radiation hardness of a bonded silicon-vacuum-silicon field effect structure with 120 kGy capability
Radiation hardness of a bonded silicon-vacuum-silicon field effect structure with 120 kGy capability
Harris, R
1d174bba-25cd-48f0-8691-684ed3612d1a
Brunnschweiler, A
2d39ef7c-b95e-476c-b435-316b6618a565
Ensell, G J
05e24f49-3922-4e5f-9aee-1e6078650579
September 1994
Harris, R
1d174bba-25cd-48f0-8691-684ed3612d1a
Brunnschweiler, A
2d39ef7c-b95e-476c-b435-316b6618a565
Ensell, G J
05e24f49-3922-4e5f-9aee-1e6078650579
Harris, R, Brunnschweiler, A and Ensell, G J
(1994)
Radiation hardness of a bonded silicon-vacuum-silicon field effect structure with 120 kGy capability.
This record has no associated files available for download.
More information
Published date: September 1994
Additional Information:
Eurosensors VIII Conference , Tolouse, France.
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 252812
URI: http://eprints.soton.ac.uk/id/eprint/252812
PURE UUID: 0e6de80a-4927-4ff5-97a1-84e38797e86d
Catalogue record
Date deposited: 23 Mar 2000
Last modified: 10 Dec 2021 20:29
Export record
Contributors
Author:
R Harris
Author:
A Brunnschweiler
Author:
G J Ensell
Download statistics
Downloads from ePrints over the past year. Other digital versions may also be available to download e.g. from the publisher's website.
View more statistics