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Experimental investigations of thermal conductivity of buried oxides in SIMOX and BESOI wafers

Experimental investigations of thermal conductivity of buried oxides in SIMOX and BESOI wafers
Experimental investigations of thermal conductivity of buried oxides in SIMOX and BESOI wafers
Tenbroek, B M
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Whiting, G
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Lee, M S L
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Edwards, C F
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Redman-White, W
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Uren, M J
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Bunyan, R J T
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Tenbroek, B M
d7af4b47-9b03-4a16-bac2-f30d4c063643
Whiting, G
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Lee, M S L
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Edwards, C F
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Redman-White, W
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Uren, M J
a01d904d-14a4-42f0-a027-631e4e37d4bf
Bunyan, R J T
d9a64ca6-7cb9-4eba-8afa-294fe386aed0

Tenbroek, B M, Whiting, G, Lee, M S L, Edwards, C F, Redman-White, W, Uren, M J and Bunyan, R J T (1997) Experimental investigations of thermal conductivity of buried oxides in SIMOX and BESOI wafers.

Record type: Conference or Workshop Item (Other)

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More information

Published date: September 1997
Additional Information: Organisation: Proc Electrochemical Society Meeting, Paris, France
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 252998
URI: http://eprints.soton.ac.uk/id/eprint/252998
PURE UUID: 10664acf-5027-472a-85a1-37ff703494ee

Catalogue record

Date deposited: 19 Apr 2000
Last modified: 10 Dec 2021 20:31

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Contributors

Author: B M Tenbroek
Author: G Whiting
Author: M S L Lee
Author: C F Edwards
Author: W Redman-White
Author: M J Uren
Author: R J T Bunyan

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