Increased low frequency noise generating defects in today's CMOS/BiCMOS technologies
Increased low frequency noise generating defects in today's CMOS/BiCMOS technologies
Murray, D C
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Siabi-Shahrivar, N
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Evans, A G R
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Redman-White, W
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Carter, J C
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Altrip, J L
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May 1989
Murray, D C
2bce70f8-76ce-4693-bd84-22f43561e746
Siabi-Shahrivar, N
c44c0070-13d6-4311-a647-ce75fb649416
Evans, A G R
c4a3f208-8fd9-491d-870f-ce7eef943311
Redman-White, W
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Carter, J C
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Altrip, J L
17142133-bd7b-47ec-8fe7-42d39fad5f2b
Murray, D C, Siabi-Shahrivar, N, Evans, A G R, Redman-White, W, Carter, J C and Altrip, J L
(1989)
Increased low frequency noise generating defects in today's CMOS/BiCMOS technologies.
European Materials Research Society Spring Meeting (E-MRS 1989), , Strasbourg, France.
30 May - 02 Jun 1989.
Record type:
Conference or Workshop Item
(Paper)
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Published date: May 1989
Venue - Dates:
European Materials Research Society Spring Meeting (E-MRS 1989), , Strasbourg, France, 1989-05-30 - 1989-06-02
Organisations:
Nanoelectronics and Nanotechnology, Southampton Wireless Group
Identifiers
Local EPrints ID: 253271
URI: http://eprints.soton.ac.uk/id/eprint/253271
PURE UUID: 7e2d689f-113d-4b3e-b159-e38d7d9d8eee
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Date deposited: 09 May 2000
Last modified: 27 Jul 2023 15:00
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Contributors
Author:
D C Murray
Author:
N Siabi-Shahrivar
Author:
A G R Evans
Author:
W Redman-White
Author:
J C Carter
Author:
J L Altrip
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