Silicon resonant strain gauges fabricated using SOI wafers
Silicon resonant strain gauges fabricated using SOI wafers
This paper details the design and fabrication process for a dynamically balanced silicon resonator. To optimise the degree of dynamic balance extensive finite element modelling (FEM) of the mechanical structure was carried out. A method of driving and detecting the optimum mode of the resonator was chosen in order to avoid compromising the mechanical design of the structure. The degree of dynamic balance has important implications for the use of the resonator in strain sensing applications. In the fabrication process silicon-on-insulator (SOI) wafers are used that enable the manufacture of the resonator in single-crystal silicon. This is an ideal mechanical material for such an application and is mechanically superior to polysilicon with wholly repeatable material properties. The fabrication process described in this paper has been designed to be relatively straightforward, thereby enabling the application of resonant strain gauges to a wide range of devices.
2/1-4
Beeby, S. P.
ba565001-2812-4300-89f1-fe5a437ecb0d
White, N. M.
c7be4c26-e419-4e5c-9420-09fc02e2ac9c
Ensell, G.
48fe0996-1c6b-4816-8bd0-0a3234d36ae8
March 2000
Beeby, S. P.
ba565001-2812-4300-89f1-fe5a437ecb0d
White, N. M.
c7be4c26-e419-4e5c-9420-09fc02e2ac9c
Ensell, G.
48fe0996-1c6b-4816-8bd0-0a3234d36ae8
Beeby, S. P., White, N. M. and Ensell, G.
(2000)
Silicon resonant strain gauges fabricated using SOI wafers.
Demonstrated Micromachining Technologies for Industry, Birmingham, United Kingdom.
.
Record type:
Conference or Workshop Item
(Other)
Abstract
This paper details the design and fabrication process for a dynamically balanced silicon resonator. To optimise the degree of dynamic balance extensive finite element modelling (FEM) of the mechanical structure was carried out. A method of driving and detecting the optimum mode of the resonator was chosen in order to avoid compromising the mechanical design of the structure. The degree of dynamic balance has important implications for the use of the resonator in strain sensing applications. In the fabrication process silicon-on-insulator (SOI) wafers are used that enable the manufacture of the resonator in single-crystal silicon. This is an ideal mechanical material for such an application and is mechanically superior to polysilicon with wholly repeatable material properties. The fabrication process described in this paper has been designed to be relatively straightforward, thereby enabling the application of resonant strain gauges to a wide range of devices.
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Published date: March 2000
Additional Information:
Event Dates: 29 March 2000 Organisation: Proceedings of IEE Colloquium "Demonstrated micromachining technologies for industry" Address: London
Venue - Dates:
Demonstrated Micromachining Technologies for Industry, Birmingham, United Kingdom, 2000-03-28
Identifiers
Local EPrints ID: 254123
URI: http://eprints.soton.ac.uk/id/eprint/254123
PURE UUID: d1abafaf-855a-4b5f-a3eb-b4e30cade6c5
Catalogue record
Date deposited: 05 Jul 2001
Last modified: 11 Dec 2021 03:01
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Contributors
Author:
S. P. Beeby
Author:
N. M. White
Author:
G. Ensell
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