Elejalde, N., Grigore, L., Ensell, G. J., Evans, A. G. R., Lee, S. L., Ogrin, F. Y. and Lee, M. A. (2001) Positive and Negative Photoresist as Thick Moulds for Electroplating High Aspect Ratio 3D Structures.
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Other
Abstract
High aspect ratio 3D structures for use as magnetic actuators.
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More information
Published date: 2001
Additional Information:
Organisation: University of St. Andrews
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 256171
URI: http://eprints.soton.ac.uk/id/eprint/256171
PURE UUID: 4ffc53d5-22bf-42b9-8bf5-cdfeb6a43fd2
Catalogue record
Date deposited: 11 Dec 2001
Last modified: 10 Dec 2021 20:42
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Contributors
Author:
N. Elejalde
Author:
L. Grigore
Author:
G. J. Ensell
Author:
A. G. R. Evans
Author:
S. L. Lee
Author:
F. Y. Ogrin
Author:
M. A. Lee
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