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Realisation of electroplating moulds with different thick photoresists for MEMs applications.

Kukharenka, A and Kraft, Michael (2002) Realisation of electroplating moulds with different thick photoresists for MEMs applications. At 4th International Conference on Material for Microelectronics and Nanoengineering, Finland. , pp. 165-168.

Record type: Conference or Workshop Item (Paper)

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More information

Published date: 2002
Additional Information: Event Dates: June 2002
Venue - Dates: 4th International Conference on Material for Microelectronics and Nanoengineering, Finland, 2002-06-01
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 257820
URI: http://eprints.soton.ac.uk/id/eprint/257820
PURE UUID: 6877ea64-66d4-4f9c-b689-f6cfa1e5d235

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Date deposited: 27 Oct 2004
Last modified: 18 Jul 2017 09:35

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Contributors

Author: A Kukharenka
Author: Michael Kraft

University divisions

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